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| <br clear="all"> | | <br clear="all"> |
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| ==SETWFR==
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| <span style="font-size: 90%; text-align: right;">[[Specific_Process_Knowledge/Lithography/EBeamLithography/JBX9500Manual#top|Go to top of this page]]</span>
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| SETWFR is the subprogram that finds and scan your global marks, i.e. P and Q marks.
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| Before executing SETWFR you should edit the parameters. Enter
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| # Measurement mode: Choose Semi-automatic.
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| # Material type: Wafer
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| # Material size: your substrate size, choose 3.0 if you expose on a chip
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| # Multi-piece window: the position of your substrate
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| # Allowable rotation value: 2-10 degrees
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| # Material Center offset position: Enter the offset found in your pre-align measurement
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| # P (and Q) point design position (material system): enter the position of your P (and Q) mark in wafer/chip coordinate system.
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| Save the subprogram and execute it.
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|
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| If it does not work, the machine will ask you whether you wish to find the marks manually by using the SEM. Before you do that, adjust the parameters of SETWFR with one (or all) of the follwing things and execute SETWFR again:
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|
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| # Increase the rough scan width of both P and Q mark to around 300 µm
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| # Set the BE coarse gain to 60 in the rough scan of P and Q mark (see under 'Gain' tab)
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| # Change the interlaced scan from 'X -> Y' to 'Y -> X', 'X only', or 'Y only' (see under 'Scan' tab)
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|
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| If nothing of the above work, accept to find the mark manually by using the SEM. Please be aware that you should only '''roughly''' find the mark with the SEM, i.e. center it on the screen, and '''not''' align with the SEM.
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|
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| When SETWFR has been executed succesfully, it will give you a corrected offset; use the offset in the section 'P-point mark measurement results' which can be found around halfways in the output (here highlighted with an arrow --->):
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| {| class = "collapsible collapsed" width=100% style = "border-radius: 10px; border: 1px solid #CE002D;"
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| ! width=100% | ========= OUTPUT of SETWFR Final result ==================
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| |-
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| <pre>
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| [Measurement information]
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| Linear scaling value = 1.000000
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| Start time = Thu Aug 6 09:17:01 2015
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| End time = Thu Aug 6 09:18:02 2015
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|
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| [Deflector]
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| P-point fine scan = PDEF
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| Q-point fine scan = PDEF
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|
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| [Measurement condition information]
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| Material type = Wafer
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| Material size [inch] = 4.0
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| Multi-piece window = 4A
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| Measurement mode = Semi-auto
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| AGC execution = No
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| Height measurement = No
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| HEIGHT automatic calculation = No
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| SUBHEI automatic calculation = No
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|
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| [Parameter for pattern writing height correction calculation]
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| PDEF GAIN X,Y = -9999 -10571
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| ROT X,Y = 12605 12962
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| SUBDEF SHIFT X,Y = -3 11
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| GAIN X,Y = 1677 649
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| ROT X,Y = -695 1043
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| The Objective lens = 29866
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| DF offset = 0
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|
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| Beam shift value after objective lens correction [nm] = 0.0 0.0
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| Beam shift value after DFOCUS OFFSET correction [nm] = 0.0 0.0
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| Height [um] = 0.000000
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|
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| [Parameter for pattern writing height correction calculation]
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| PQ GAIN coefficient [nm/100mm] = 5.567214e+02 5.567214e+02
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|
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| [PDEF DAC value calculated from PQ GAIN/ROT]
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| PDEF GAIN X,Y = 90 89
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| ROT X,Y = -5490 -5501
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|
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| [SUBDEF DAC value calculated from PQ GAIN/ROT]
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| SUBDEF SHIFT X,Y = 0 0
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| GAIN X,Y = -21 -12
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| ROT X,Y = -322 323
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|
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| [PDEF DAC value calculated from lens4 + height]
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| PDEF GAIN X,Y = 0 0
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| ROT X,Y = 0 0
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|
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| [SUBDEF DAC value calculated from lens4 + height]
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| SUBDEF SHIFT X,Y = 0 0
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| GAIN X,Y = 0 0
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| ROT X,Y = 0 0
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|
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| [Total component DAC value of PQ correction]
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| PDEF GAIN X,Y = 90 89
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| ROT X,Y = -5490 -5501
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| SUBDEF SHIFT X,Y = 0 0
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| GAIN X,Y = -21 -12
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| ROT X,Y = -322 323
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| The Objective lens = 0
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| DF offset = 0
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|
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| Material correction coefficient SHIFT X,Y [nm] = 55513.827000 -40956.899500
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| GAIN X,Y [nm/100mm] = 556.721379 556.721379
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| ROT X,Y [rad] = -0.005500 -0.005500
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| Material center position X,Y [um] = 90000.0000 55000.0000
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| Material rotation angle [degree] = -0.3151517494
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| Reference height [um] = 0.000000
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| Average height [um] = 0.000000
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|
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| [P-point mark measurement result]
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| Design position (material coordinates) X,Y[um] = -35000.0000 0.0000
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| Observation position (material coordinates) X,Y[um] = -34944.1516 -233.4722
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| ---> Offset X,Y[um] = 55.8484 -233.4722
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| Mark rotation angle(+clockwise) [degree] = -3.119790e-01
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| Height measurement = No height measurement
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| Height [um] = 0.000000e+00
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|
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|
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| [Q-point mark measurement result]
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| Design position (material coordinates) X,Y[um] = 35000.0000 0.0000
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| Observation position (material coordinates) X,Y[um] = 35055.1792 151.5585
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| Offset X,Y[um] = 55.1792 151.5585
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| Mark rotation angle(+clockwise) [degree] = -3.308954e-01
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| Height measurement = No height measurement
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| Height [um] = 0.000000e+00
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|
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| [P-point correction data]
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| PDEF GAIN X,Y = -10089 -10660
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| ROT X,Y = 18095 18463
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| SUBDEF SHIFT X,Y = -3 11
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| GAIN X,Y = 1698 661
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| ROT X,Y = -373 720
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| The Objective lens = 29866
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| DF offset = 0
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|
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| Beam shift value after objective lens correction [nm] = 0.0 0.0
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| Beam shift value after DFOCUS OFFSET correction [nm] = 0.0 0.0
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| Height [um] = 0.000000
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|
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| P-point mark shift [um] = 55.3296, -42.8961
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|
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| HEIGHT
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| The amount of minute compensation of a focus lens [point] = 0
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| The amount of minute compensation of beam position shift X [nm] = 0.0
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| Y [nm] = 0.0
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| The amount of minute compensation of a main deflector gain X [point] = 0
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| Y [point] = 0
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| The amount of minute compensation of a main deflector rotation X [point] = 0
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| Y [point] = 0
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| SUBHEI
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| The amount of minute compensation of a sub deflector shift X [point] = 0
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| Y [point] = 0
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| The amount of minute compensation of a sub deflector gain X [point] = 0
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| Y [point] = 0
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| The amount of minute compensation of a sub deflector rotation X [point] = 0
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| Y [point] = 0
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|
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| ======================================================
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| </pre>
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|
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| |-
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| |}
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| <br> <br>
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|
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| = Troubleshooting = | | = Troubleshooting = |
