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Specific Process Knowledge/Lithography/EBeamLithography/JBX9500Manual: Difference between revisions

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'''When the subprogram 'SETWFR' has found the P and Q marks'''
'''When the subprogram 'SETWFR' has found the P and Q marks'''


When SETWFR executes successfully feedback the 'P mark offset' to the OFFSET in the sdf file and re-compile the mgn-file.
 
 
When SETWFR has been executed succesfully, it will give you a corrected offset; use the offset in the section 'P-point mark measurement results' which can be found around halfways in the output (here highlighted with an arrow --->):
{| class = "collapsible collapsed" width=100% style = "border-radius: 10px; border: 1px solid #CE002D;"
! width=100% | ========= OUTPUT of SETWFR Final result ==================
|-
|
<pre>
[Measurement information]
Linear scaling value      = 1.000000
Start time                = Thu Aug  6 09:17:01 2015
End time                  = Thu Aug  6 09:18:02 2015
 
[Deflector]
P-point fine scan            = PDEF
Q-point fine scan            = PDEF
 
[Measurement condition information]
Material type                = Wafer
Material size          [inch] = 4.0
Multi-piece window            = 4A
Measurement mode              = Semi-auto
AGC execution                = No
Height measurement            = No
HEIGHT automatic calculation  = No
SUBHEI automatic calculation  = No
 
[Parameter for pattern writing height correction calculation]
PDEF  GAIN  X,Y          =      -9999      -10571
      ROT  X,Y          =      12605        12962
SUBDEF SHIFT X,Y          =          -3          11
      GAIN  X,Y          =        1677          649
      ROT  X,Y          =        -695        1043
The Objective lens        =      29866
DF offset                  =          0
 
Beam shift value after objective lens correction [nm] =        0.0          0.0
Beam shift value after DFOCUS OFFSET  correction [nm] =        0.0          0.0
Height                                          [um] =    0.000000
 
[Parameter for pattern writing height correction calculation]
PQ GAIN coefficient    [nm/100mm] = 5.567214e+02  5.567214e+02
 
[PDEF DAC value calculated from PQ GAIN/ROT]
PDEF  GAIN  X,Y          =          90          89
      ROT  X,Y          =      -5490        -5501
 
[SUBDEF DAC value calculated from PQ GAIN/ROT]
SUBDEF SHIFT X,Y          =          0            0
      GAIN  X,Y          =        -21          -12
      ROT  X,Y          =        -322          323
 
[PDEF DAC value calculated from lens4 + height]
PDEF  GAIN  X,Y          =          0            0
      ROT  X,Y          =          0            0
 
[SUBDEF DAC value calculated from lens4 + height]
SUBDEF SHIFT X,Y          =          0            0
      GAIN  X,Y          =          0            0
      ROT  X,Y          =          0            0
 
[Total component DAC value of PQ correction]
PDEF  GAIN  X,Y          =          90          89
      ROT  X,Y          =      -5490        -5501
SUBDEF SHIFT X,Y          =          0            0
      GAIN  X,Y          =        -21          -12
      ROT  X,Y          =        -322          323
The Objective lens        =          0
DF offset                  =          0
 
Material correction coefficient SHIFT X,Y        [nm] = 55513.827000  -40956.899500
                                GAIN  X,Y  [nm/100mm] =  556.721379  556.721379
                                ROT  X,Y      [rad] =  -0.005500    -0.005500
Material center position X,Y                    [um] =  90000.0000  55000.0000
Material rotation angle                      [degree] = -0.3151517494
Reference height                                [um] =    0.000000
Average height                                  [um] =    0.000000
 
[P-point mark measurement result]
Design position (material coordinates)      X,Y[um] = -35000.0000      0.0000
Observation position (material coordinates) X,Y[um] = -34944.1516  -233.4722
--->  Offset                                      X,Y[um] =    55.8484  -233.4722
Mark rotation angle(+clockwise)            [degree] = -3.119790e-01
Height measurement                                  = No height measurement
Height                                        [um] = 0.000000e+00
 
 
[Q-point mark measurement result]
Design position (material coordinates)      X,Y[um] =  35000.0000      0.0000
Observation position (material coordinates) X,Y[um] =  35055.1792    151.5585
Offset                                      X,Y[um] =    55.1792    151.5585
Mark rotation angle(+clockwise)            [degree] = -3.308954e-01
Height measurement                                  = No height measurement
Height                                        [um] = 0.000000e+00
 
[P-point correction data]
PDEF  GAIN  X,Y          =      -10089      -10660
      ROT  X,Y          =      18095        18463
SUBDEF SHIFT X,Y          =          -3          11
      GAIN  X,Y          =        1698          661
      ROT  X,Y          =        -373          720
The Objective lens        =      29866
DF offset                  =          0
 
Beam shift value after objective lens correction [nm] =        0.0          0.0
Beam shift value after DFOCUS OFFSET correction [nm] =        0.0          0.0
Height                                          [um] =    0.000000
 
P-point mark shift [um] =    55.3296,    -42.8961
 
HEIGHT
The amount of minute compensation of a focus lens                [point] = 0
The amount of minute compensation of beam position shift      X    [nm] = 0.0
                                                                Y    [nm] = 0.0
The amount of minute compensation of a main deflector gain    X [point] = 0
                                                                Y [point] = 0
The amount of minute compensation of a main deflector rotation X [point] = 0
                                                                Y [point] = 0
SUBHEI
The amount of minute compensation of a sub deflector shift    X [point] = 0
                                                                Y [point] = 0
The amount of minute compensation of a sub deflector gain      X [point] = 0
                                                                Y [point] = 0
The amount of minute compensation of a sub deflector rotation  X [point] = 0
                                                                Y [point] = 0
 
======================================================
</pre>
 
|-
|}
 
<br> <br>


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[[File:RoughScanGain.png|400px|right]]
[[File:RoughScanGain.png|400px|right]]


'''If the program cannot find the marks''', you can either adjust the scan conditions, or gain settings. Also, test SETWFR again with 'OFFSET (P-mark)' from the pre-aligner output.
'''If the program cannot find the marks''', the machine will ask you whether you wish to find the marks manually by using the SEM. Before you do that, adjust the parameters of SETWFR with one (or all) of the follwing things and execute SETWFR again:
 


Find the mark manually and let SETWFR scan the mark to align the sample:
# Increase the rough scan width of both P and Q mark to around 300 µm
# Change the scan position of both P and Q mark so it scans the opposite arm as before, i.e. scans at -30 µm instead of +30 µm
# Set the BE coarse gain to 60 in the rough scan of P and Q mark (see under 'Gain' tab)
# Change the interlaced scan from 'X -> Y' to 'Y -> X', 'X only', or 'Y only' (see under 'Scan' tab)


As a last alternative, you can chose to find the mark manually; this is however not recommended.
If nothing of the above work, accept to find the mark manually by using the SEM. Please be aware that you should only '''roughly''' find the mark with the SEM, i.e. center it on the screen, and '''not''' align with the SEM.


SETWFR will ask you whether you wish to find the mark manually, click OK.
As a last alternative, you can chose to find the mark manually; SETWFR will ask you whether you wish to find the mark manually, click OK.


*In 'sspvideo' click 'change/SEM'
*In 'sspvideo' click 'change/SEM'
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Please note that you should NOT align with the SEM but only roughly center the mark so you are sure the mark will be scanned with your scan settings.
Please note that '''you should not align with the SEM but only roughly center the mark so you are sure the mark will be scanned with your scan settings.'''