Specific Process Knowledge/Lithography/EBeamLithography/JBX9500Manual: Difference between revisions
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If nothing of the above work, accept to find the mark manually by using the SEM. Please be aware that you should only '''roughly''' find the mark with the SEM, i.e. center it on the screen, and '''not''' align with the SEM. | If nothing of the above work, accept to find the mark manually by using the SEM. Please be aware that you should only '''roughly''' find the mark with the SEM, i.e. center it on the screen, and '''not''' align with the SEM. | ||
When SETWFR has been executed succesfully, it will give you a corrected offset; use the offset in the section 'P-point mark measurement results' which can be found around halfways in the output: | When SETWFR has been executed succesfully, it will give you a corrected offset; use the offset in the section 'P-point mark measurement results' which can be found around halfways in the output (here highlighted with an arrow --->): | ||
{| class = "collapsible collapsed" width=100% style = "border-radius: 10px; border: 1px solid #CE002D;" | {| class = "collapsible collapsed" width=100% style = "border-radius: 10px; border: 1px solid #CE002D;" | ||
! width=100% | ========= OUTPUT of SETWFR Final result ================== | ! width=100% | ========= OUTPUT of SETWFR Final result ================== | ||