Specific Process Knowledge/Lithography/EBeamLithography/JBX9500Manual: Difference between revisions
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!style="background:#ADD8E6; color:Black"|PDEFBE | !style="background:#ADD8E6; color:Black"|[[Specific_Process_Knowledge/Lithography/EBeamLithography/JBX9500Manual#PDEFBE|PDEFBE]] | ||
|Using a BE mark, this subprogram corrects deflection gain and rotation of the main deflector. The system positions the BE mark in the corners of the main field (which is a 1000 x 1000 µm2 square) and scans the mark using the primary deflector only. | |Using a BE mark, this subprogram corrects deflection gain and rotation of the main deflector. The system positions the BE mark in the corners of the main field (which is a 1000 x 1000 µm2 square) and scans the mark using the primary deflector only. | ||
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