Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions
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== Dose variation defined by an array in jdf file == | == Dose variation defined by an array in jdf file == | ||
Another even faster way to define dose modulation (if you have less than 10-15 different doses) is to repeat the pattern (v30-file) in an array with different doses in the jdf file, just type the dose modulation you wish to apply to every chip in the array: | |||
<pre> | <pre> | ||
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</pre> | </pre> | ||
== Proximity Error Correction (PEC) == | == Proximity Error Correction (PEC) == | ||