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The JEOL JBX-9500FS electron beam lithography system is a spot electron beam lithography system designed for use in writing patterns with dimensions from nanometers to sub-micrometers.
The JEOL JBX-9500FS electron beam lithography system is a spot electron beam lithography system designed for use in writing patterns (10 nm - 1 µm) in electron sensitive resists.




Substrates that needs e-beam exposure should be mounted in a cassette and transferred into the writer via the robot loader (autoloader).
Substrates coated with resists are mounted in a cassette and transferred into the e-beam writer via the robot loader (autoloader). Even fully trained users are only authorized to mount substrates into the e-beam cassettes but '''not''' authorized to load the cassettes into the autoloader.


 
After your exposure, fully trained users can unload their cassettes from the autoloader, unmount their substrates and re-load an '''empty''' cassette into the autoloader.
To request for an e-beam training session, contact e-beam@danchip.dtu.dk; a DTU Danchip personnel will hereafter provide a time slot. For safety reasons, even fully trained users are only authorized to mount substrates into the e-beam cassettes but not authorized to load the cassettes into the autoloader.
 
To use the e-beam writer, book the machine via LabManager, and ask help from DTU Danchip staff to load your cassette into the robot loader (autoloader).
 
 
After your exposure, fully trained users can unload their cassettes from the autoloader, unmount their substrates and re-load an empty cassette into the autoloader.


If you are prohibited to unmount your substrates before another user requires the cassette, you must accept that either the next user or DTU Danchip personel unmount your substrates.
If you are prohibited to unmount your substrates before another user requires the cassette, you must accept that either the next user or DTU Danchip personel unmount your substrates.
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Manuals
Manuals


There are 3 manuals for the e-beam writer; apart from the main manual (this manual) there is a sdf and jdf-file manual, and a BEAMER manual. They can both be accessed from LabManager under Technical documents.
There are 3 manuals for the e-beam writer; apart from the main manual (this manual) there is a sdf and jdf-file manual, and a BEAMER manual. They can all 3 be accessed from LabAdviser or from LabManager under Technical documents.
 
 
The original JEOL manual for the e-beam writer JEOL JBX-9500FS is located on the O-drive: O:\CleanroomDrive\_Equipment\E-beam
Technical Specification.




The original JEOL manual for the e-beam writer FS9500 is located on the O-drive: O:\CleanroomDrive\_Equipment\E-beam
Technical Specification
The system can be characterized as follows:
The system can be characterized as follows:


Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/EBeamLithography/JBX9500Manual"