Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
| Line 103: | Line 103: | ||
# Prepare your pattern using a layout software (L-edit, CleWin, CAD) and export that to GDS format. Check your GDS-file by importing it in e.g. <span class="plainlinks">[http://www.wieweb.com/ns6/index.html CleWin]</span> or L-edit. In order to reach the files from the computers inside the cleanroom it is recommended to either dropbox them or send them per email to yourself. | # Prepare your pattern using a layout software (L-edit, CleWin, CAD) and export that to GDS format. Check your GDS-file by importing it in e.g. <span class="plainlinks">[http://www.wieweb.com/ns6/index.html CleWin]</span> or L-edit. In order to reach the files from the computers inside the cleanroom it is recommended to either dropbox them or send them per email to yourself. | ||
# Convert the GDS file to v30 using BEAMER; a manual for BEAMER software is found [Specific_Process_Knowledge/Lithography/EBeamLithography/BEAMER|here] | # Convert the GDS file to v30 using BEAMER; a manual for BEAMER software is found [[Specific_Process_Knowledge/Lithography/EBeamLithography/BEAMER|here]] | ||
'''Create sdf and jdf-files:''' | '''Create sdf and jdf-files:''' | ||
| Line 115: | Line 115: | ||
#Assist a fully trained colleague of yours when she or he e-beam writes, gather as much knowledge about your e-beam run, i.e. which e-beam current, aperture and dose to use, which shot pitch (e.g. SHOT A,10). | #Assist a fully trained colleague of yours when she or he e-beam writes, gather as much knowledge about your e-beam run, i.e. which e-beam current, aperture and dose to use, which shot pitch (e.g. SHOT A,10). | ||
# Study the logbook for the e-beam writer: sheet 1 gives you an overview of which condition files (currents and apertures) have been in use recently by which user on which type of resist. On sheet 2 in this logbook you can find a writing time estimation program. | # Study the logbook for the e-beam writer: sheet 1 gives you an overview of which condition files (currents and apertures) have been in use recently by which user on which type of resist. On sheet 2 in this logbook you can find a writing time estimation program. | ||
# Study the manual for the machine, it can be found [Specific_Process_Knowledge/Lithography/EBeamLithography/JBX9500Manual|here]] | # Study the manual for the machine, it can be found [[Specific_Process_Knowledge/Lithography/EBeamLithography/JBX9500Manual|here]] | ||
<br clear="all" /> | <br clear="all" /> | ||