Specific Process Knowledge/Lithography/EBeamLithography/JBX9500Manual: Difference between revisions

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 |-style="background:WhiteSmoke; color:black"
 !style="background:#ADD8E6; color:Black"|DISTMEM
-|This subprogram measures the distortion of the beam deflection within the field, writes to the deflection distortion correction memory, and create a deflection distortion correction file. The program sets the distortion directly below the beam (center of the field) to zero.
+|This subprogram measures the distortion of the beam deflection 7 x 7 positions within the main writing field and generates a distortion correction table. The program sets the distortion directly below the beam (center of the field) to zero. The distortion correction memory in every position in the main writing field is generated by a linear approximation based on the 7 x 7 table. For 0.2 nA or 2 nA, a reasonable convergence value is e.g. 6 nm.
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 |-style="background:WhiteSmoke; color:black"
 !style="background:#ADD8E6; color:Black"|DISTBE
-|This subprogram measures and corrects the deflection distortion of the beam in the entire writing field (using both deflectors to deflect the beam). The most important input parameter of this subprogram is the ''''allowable convergence value''' which ideally is set to a few nanometers above the convergence value output of PDEFBE. For 0.2 nA, a reasonable convergence value is e.g. 8 nm.
+|This subprogram measures the distortion of the beam deflection 7 x 7 positions within the main writing field and generates a distortion correction table. The program sets the distortion directly below the beam (center of the field) to zero. The distortion correction memory in every position in the main writing field is generated by a cubic approximation based on the 7 x 7 table. For 0.2 nA or 2 nA, a reasonable convergence value is e.g. 8 nm.
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