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Specific Process Knowledge/Thermal Process/Oxidation: Difference between revisions

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==Oxidation==
==Oxidation==
At Danchip we have seven furnaces for oxidation of silicon samples: Boron Drive-in and Pre-dep furnace (A1), Phosphorous Drive-in furnace (A3), Noble furnace, Anneal-oxide furnace (C1), Anneal-Bond furnace (C3), APOX furnace (D1) and Multipurpose Annealing furnace.
At Danchip we have seven furnaces for oxidation of silicon samples: Boron Drive-in + Pre-dep furnace (A1), Phosphorous Drive-in furnace (A3), Noble furnace, Anneal-oxide furnace (C1), Anneal-Bond furnace (C3), APOX furnace (D1) and Multipurpose Annealing furnace.


Oxidation can take place either by a dry process or a wet process, depending on what furnace that is used for the oxidation. The film quality for a dry oxide is better than the film quality for a wet oxide with regards to density and dielectric constant. However, the oxidation rate is slow for a dry oxide.
Oxidation can take place either by a dry process or a wet process, depending on what furnace that is used for the oxidation. The film quality for a dry oxide is better than the film quality for a wet oxide with regards to density and dielectric constant. However, the oxidation rate is slow for a dry oxide.
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*Very thick oxide layers >4 µm can be grown in D1 by a wet oxidation (only performed by Danchip).
*Very thick oxide layers >4 µm can be grown in D1 by a wet oxidation (only performed by Danchip).


The standard recipes, quality control limits and results for the Boron Drive-in + Predep furnace (A1) and the Phosphorus Drive-in furnace (A3) can be found here:  
The standard recipes, quality control limits and results for the Boron Drive-in + Pre-dep furnace (A1) and the Phosphorus Drive-in furnace (A3) can be found here:  


*[[Specific Process Knowledge/Thermal Process/A1 Furnace Boron drive-in|Standard recipes, QC limits and results for the Boron Drive-in + Predep furnace (A1)]]
*[[Specific Process Knowledge/Thermal Process/A1 Furnace Boron drive-in|Standard recipes, QC limits and results for the Boron Drive-in + Predep furnace (A1)]]
*[[Specific Process Knowledge/Thermal Process/A3 Phosphor Drive-in furnace|Standard recipes, QC limits and results for the Phosphorus Drive-in furnace (A3)]]
*[[Specific Process Knowledge/Thermal Process/A3 Phosphor Drive-in furnace|Standard recipes, QC limits and results for the Phosphorus Drive-in furnace (A3)]]
The wet oxidation rates for the Anneal-Bond furnace (C1) can be found here:
*[[Specific Process Knowledge/Thermal Process/Oxidation/Wet oxidation C1 furnace|Wet oxidation in Anneal-oxide furnace (C1)]]
*[[Specific Process Knowledge/Thermal Process/Oxidation/Wet oxidation C1 furnace|Wet oxidation in Anneal-oxide furnace (C1)]]