Jump to content

Specific Process Knowledge/Thin Film deposition/ALD/TiO2 deposition using ALD: Difference between revisions

Pevo (talk | contribs)
No edit summary
Pevo (talk | contribs)
No edit summary
Line 67: Line 67:


Evgeniy Shkondin, DTU Danchip, 2014.
Evgeniy Shkondin, DTU Danchip, 2014.
====TiO<sub>2</sub> deposition on trenches====
For TiO<sub>2</sub> deposition on trenches more information can be found here:
*[[Specific Process Knowledge/Thin Film deposition/ALD/TiO2 deposition using ALD/TiO2 deposition on trenches using ALD|TiO<sub>2</sub> deposition on trenches using ALD]]