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Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma UV processing: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,798 edits
Line 74: Line 74:
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|Si with native oxide
|Si with native oxide
|78°
|78±1°
|28/5 2015
|28/5 2015
|taran
|taran
Line 118: Line 118:
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|Si with native oxide
|Si with native oxide
|70°
|70±1°
|28/5 2015
|28/5 2015
|taran
|taran
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