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Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma UV processing: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,527 edits
Line 56: Line 56:
*'''(0001) HMDS Standard'''
*'''(0001) HMDS Standard'''
VPO temperature: 120°C <br>
VPO temperature: 120°C <br>
Process parameters: 30s vacuum bake @ -0.67 bar, HMDS injection, 180s reaction @ -0.28 bar, 20s cooling @ 21°C.
Process parameters: 30s vacuum bake @ -0.67 bar, HMDS injection, 90s reaction @ ambient, 20s cooling @ 21°C.


Test results:
Test results:
Line 74: Line 74:
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|Si with native oxide
|Si with native oxide
|79.3°
|78°
|22/5 2015
|28/5 2015
|taran
|taran
|average of three measurements on one sample
|average of three measurements on three sample from three different days


|-
|-
Line 100: Line 100:
*''' (0002) HMDS fast'''
*''' (0002) HMDS fast'''
VPO temperature: 120°C <br>
VPO temperature: 120°C <br>
Process parameters: 30s vacuum bake @ -0.67 bar, HMDS injection, 15s reaction @ -0.28 bar, 20s cooling @ 21°C.
Process parameters: 30s vacuum bake @ -0.67 bar, HMDS injection, 15s reaction @ ambient, 20s cooling @ 21°C.


Test results:
Test results:
Line 118: Line 118:
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|Si with native oxide
|Si with native oxide
|72.8°
|70°
|22/5 2015
|28/5 2015
|taran
|taran
|average of three measurements on one sample
|average of three measurements on three sample from three different days


|-
|-
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