Specific Process Knowledge/Thin Film deposition/ALD/TiO2 deposition using ALD: Difference between revisions
| Line 10: | Line 10: | ||
For Si wafers, amorphous TiO<sub>2</sub> is best grown on wafers with native oxide, and anatase TiO<sub>2</sub> is best grown on wafers without native oxide (removed using HF). | For Si wafers, amorphous TiO<sub>2</sub> is best grown on wafers with native oxide, and anatase TiO<sub>2</sub> is best grown on wafers without native oxide (removed using HF). | ||
===TiO<sub>2</sub> standard recipe=== | ====TiO<sub>2</sub> standard recipe==== | ||
<b>Recipe</b>: TiO2 | <b>Recipe</b>: TiO2 | ||
| Line 35: | Line 35: | ||
|- | |- | ||
|} | |} | ||
===TiO<sub>2</sub> deposition rates=== | ===TiO<sub>2</sub> deposition rates=== | ||