Specific Process Knowledge/Thin Film deposition/ALD/TiO2 deposition using ALD: Difference between revisions
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image:TiO2 350C 1250 cycles Si_HF_treated.jpg| Temperature 350 <sup>o</sup>C, 1250 cycles, HF treated. | image:TiO2 350C 1250 cycles Si_HF_treated.jpg| Temperature 350 <sup>o</sup>C, 1250 cycles, HF treated. | ||
</gallery> | </gallery> | ||
Below some SEM images of anatase TiO<sub>2</sub> deposited at 120 <sup>o</sup>C on Si trenches are shown. The width of the trenches is 200 nm, and the depth is 4 µm, i.e. the aspect ratio is 1:20. The number of cycles is 500, and this results in a TiO<sub>2</sub> layer of about 25 nm. From the SEM images it is seen that the TiO<sub>2</sub> layer covers the trenches very well. | Below some SEM images of anatase TiO<sub>2</sub> deposited at 120 <sup>o</sup>C on Si trenches are shown. The width of the trenches is 200 nm, and the depth is 4 µm, i.e. the aspect ratio is 1:20. The number of cycles is 500, and this results in a TiO<sub>2</sub> layer of about 25 nm. From the SEM images it is seen that the TiO<sub>2</sub> layer covers the trenches very well. | ||
<gallery caption="" widths="250px" heights="250px" perrow=" | <gallery caption="Anatase titanium dioxide deposited on Si trenches" widths="250px" heights="250px" perrow="3"> | ||
image:SEM-TiO2-120C-1.jpg| | image:SEM-TiO2-120C-1.jpg| | ||
image:SEM-TiO2-120C-2.jpg| | image:SEM-TiO2-120C-2.jpg| | ||
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Below some SEM images of amorphous TiO<sub>2</sub> deposited at 300 <sup>o</sup>C on Si trenches are shown. The width of the trenches is 200 nm, and the depth is 4 µm, i.e. the aspect ratio is 1:20. The number of cycles is 500, and this results in a TiO<sub>2</sub> layer of about 26 nm. From the SEM images it is seen that the TiO<sub>2</sub> layer covers the trenches very well. | Below some SEM images of amorphous TiO<sub>2</sub> deposited at 300 <sup>o</sup>C on Si trenches are shown. The width of the trenches is 200 nm, and the depth is 4 µm, i.e. the aspect ratio is 1:20. The number of cycles is 500, and this results in a TiO<sub>2</sub> layer of about 26 nm. From the SEM images it is seen that the TiO<sub>2</sub> layer covers the trenches very well. | ||
<gallery caption="" widths="250px" heights="250px" perrow=" | <gallery caption="Amorphous titanium dioxide deposited on Si trenches" widths="250px" heights="250px" perrow="3"> | ||
image:TiO2 trenches-300C-1.jpg| | image:TiO2 trenches-300C-1.jpg| | ||
image:TiO2 trenches-300C-2.jpg| | image:TiO2 trenches-300C-2.jpg| | ||