Specific Process Knowledge/Lithography/EBeamLithography/JBX9500Manual: Difference between revisions
| Line 537: | Line 537: | ||
<br clear="all"> | <br clear="all"> | ||
===SETWFR=== | |||
<span style="font-size: 90%; text-align: right;">[[Specific_Process_Knowledge/Lithography/EBeamLithography/JBX9500Manual#top|Go to top of this page]]</span> | |||
{| class = "collapsible collapsed" width=100% style = "border-radius: 10px; border: 1px solid #CE002D;" | |||
! width=100% | ========= OUTPUT of SETWFR Final result (2nA ap5) ================== | |||
|- | |||
| | |||
<pre> | |||
[Measurement information] | |||
Linear scaling value = 1.000000 | |||
Start time = Thu Aug 6 09:17:01 2015 | |||
End time = Thu Aug 6 09:18:02 2015 | |||
[Deflector] | |||
P-point fine scan = PDEF | |||
Q-point fine scan = PDEF | |||
[Measurement condition information] | |||
Material type = Wafer | |||
Material size [inch] = 4.0 | |||
Multi-piece window = 4A | |||
Measurement mode = Semi-auto | |||
AGC execution = No | |||
Height measurement = No | |||
HEIGHT automatic calculation = No | |||
SUBHEI automatic calculation = No | |||
[Parameter for pattern writing height correction calculation] | |||
PDEF GAIN X,Y = -9999 -10571 | |||
ROT X,Y = 12605 12962 | |||
SUBDEF SHIFT X,Y = -3 11 | |||
GAIN X,Y = 1677 649 | |||
ROT X,Y = -695 1043 | |||
The Objective lens = 29866 | |||
DF offset = 0 | |||
Beam shift value after objective lens correction [nm] = 0.0 0.0 | |||
Beam shift value after DFOCUS OFFSET correction [nm] = 0.0 0.0 | |||
Height [um] = 0.000000 | |||
[Parameter for pattern writing height correction calculation] | |||
PQ GAIN coefficient [nm/100mm] = 5.567214e+02 5.567214e+02 | |||
[PDEF DAC value calculated from PQ GAIN/ROT] | |||
PDEF GAIN X,Y = 90 89 | |||
ROT X,Y = -5490 -5501 | |||
[SUBDEF DAC value calculated from PQ GAIN/ROT] | |||
SUBDEF SHIFT X,Y = 0 0 | |||
GAIN X,Y = -21 -12 | |||
ROT X,Y = -322 323 | |||
[PDEF DAC value calculated from lens4 + height] | |||
PDEF GAIN X,Y = 0 0 | |||
ROT X,Y = 0 0 | |||
[SUBDEF DAC value calculated from lens4 + height] | |||
SUBDEF SHIFT X,Y = 0 0 | |||
GAIN X,Y = 0 0 | |||
ROT X,Y = 0 0 | |||
[Total component DAC value of PQ correction] | |||
PDEF GAIN X,Y = 90 89 | |||
ROT X,Y = -5490 -5501 | |||
SUBDEF SHIFT X,Y = 0 0 | |||
GAIN X,Y = -21 -12 | |||
ROT X,Y = -322 323 | |||
The Objective lens = 0 | |||
DF offset = 0 | |||
Material correction coefficient SHIFT X,Y [nm] = 55513.827000 -40956.899500 | |||
GAIN X,Y [nm/100mm] = 556.721379 556.721379 | |||
ROT X,Y [rad] = -0.005500 -0.005500 | |||
Material center position X,Y [um] = 90000.0000 55000.0000 | |||
Material rotation angle [degree] = -0.3151517494 | |||
Reference height [um] = 0.000000 | |||
Average height [um] = 0.000000 | |||
[P-point mark measurement result] | |||
Design position (material coordinates) X,Y[um] = -35000.0000 0.0000 | |||
Observation position (material coordinates) X,Y[um] = -34944.1516 -233.4722 | |||
Offset X,Y[um] = 55.8484 -233.4722 | |||
Mark rotation angle(+clockwise) [degree] = -3.119790e-01 | |||
Height measurement = No height measurement | |||
Height [um] = 0.000000e+00 | |||
[Q-point mark measurement result] | |||
Design position (material coordinates) X,Y[um] = 35000.0000 0.0000 | |||
Observation position (material coordinates) X,Y[um] = 35055.1792 151.5585 | |||
Offset X,Y[um] = 55.1792 151.5585 | |||
Mark rotation angle(+clockwise) [degree] = -3.308954e-01 | |||
Height measurement = No height measurement | |||
Height [um] = 0.000000e+00 | |||
[P-point correction data] | |||
PDEF GAIN X,Y = -10089 -10660 | |||
ROT X,Y = 18095 18463 | |||
SUBDEF SHIFT X,Y = -3 11 | |||
GAIN X,Y = 1698 661 | |||
ROT X,Y = -373 720 | |||
The Objective lens = 29866 | |||
DF offset = 0 | |||
Beam shift value after objective lens correction [nm] = 0.0 0.0 | |||
Beam shift value after DFOCUS OFFSET correction [nm] = 0.0 0.0 | |||
Height [um] = 0.000000 | |||
P-point mark shift [um] = 55.3296, -42.8961 | |||
HEIGHT | |||
The amount of minute compensation of a focus lens [point] = 0 | |||
The amount of minute compensation of beam position shift X [nm] = 0.0 | |||
Y [nm] = 0.0 | |||
The amount of minute compensation of a main deflector gain X [point] = 0 | |||
Y [point] = 0 | |||
The amount of minute compensation of a main deflector rotation X [point] = 0 | |||
Y [point] = 0 | |||
SUBHEI | |||
The amount of minute compensation of a sub deflector shift X [point] = 0 | |||
Y [point] = 0 | |||
The amount of minute compensation of a sub deflector gain X [point] = 0 | |||
Y [point] = 0 | |||
The amount of minute compensation of a sub deflector rotation X [point] = 0 | |||
Y [point] = 0 | |||
====================================================== | |||
</pre> | |||
|- | |||
|} | |||
<br> <br> | |||
= Exposure of mgn-files = | = Exposure of mgn-files = | ||