Specific Process Knowledge/Lithography/EBeamLithography/JBX9500Manual: Difference between revisions
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'''In mask writing mode''', i.e. where the pattern is exposed on a blank wafer, it is recommended to use a BE mark as a drift mark. | '''In mask writing mode''', i.e. where the pattern is exposed on a blank wafer, it is recommended to use a BE mark as a drift mark. | ||
<br " | [[file:DRIFT mark.png|450px|right]] | ||
You can choose any mark as a DRIFT mark. In a standard exposure, a (bottom plane) BE mark is used as DRIFT mark, but you can ask the machine to use one of your global marks as well, i.e. P or Q marks. This requires alignment in semi-automatic mode, however. | |||
The table below is provided by JEOL. According to this, a global mark (P) can be used as a DRIFT mark in automatic or semi-automatic alignment mode if CHIPAL 0, V1, V4 or S is used. A chip mark can be used as a DRIFT mark in any case where CHIPAL is defined to CHIPAL 1 or CHIPAL 4. | |||
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== HEIMAP == | == HEIMAP == | ||