Specific Process Knowledge/Lithography/EBeamLithography/JBX9500Manual: Difference between revisions
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=== DISTMEM and DISTBE === | === DISTMEM and DISTBE === | ||
DISTMEM and DISTBE measures the distortion of the beam over the entire writing field, i.e. positional errors in the beam over the entire writing field. | |||
Both programs use the bottom BE mark to detect these errors. The stage moves the mark to 7 x 7 positions distributed over 1 x 1 mm^2 writing field. At each position, the beam is deflected by the primary deflector to scan the mark. The distortion is defined as the offset between the actual stage position and position of the mark measured by the beam. | |||
After measuring all 7 x 7 points, the machine generate a distortion correction table and measures again. This procedure is repeated until the maximum offset is as specified in 'allowable convergence value' in DISTBE or DISTMEM. | |||
If the convergence value is not met after 3-4 measurements, the scan position on the BE mark should be changed as described in troubleshooting. | |||