Specific Process Knowledge/Characterization: Difference between revisions
| Line 21: | Line 21: | ||
*Nanoman - ''AFM - can be used for nanomanipulation'' | *Nanoman - ''AFM - can be used for nanomanipulation'' | ||
===[[Profiler]]=== | ===[[Profiler]]=== | ||
*[[Dektak 8 stylus profiler]] | |||
*Tencor | *Tencor | ||
===[[Optical microscope]]=== | ===[[Optical microscope]]=== | ||
===[[Optical characterization]]=== | ===[[Optical characterization]]=== | ||
Revision as of 07:39, 18 October 2007
Choose topic
- Surface imaging
- Topographic measurement
- Stress measurement
- Filmthickness measurement
- Element analysis
- Measurement of optical constants
- Hydrophobicity measurement
- Resistivity measurement
- Wafer thickness measurement
Choose equipment
SEM: Scanning Electron Microscopy
- LEO SEM
- FEI SEM
- JEOL SEM
AFM: Atomic Force Microscopy
- Nanoman - AFM - can be used for nanomanipulation
Profiler
- Dektak 8 stylus profiler
- Tencor
Optical microscope
Optical characterization
- Ellipsometer
- Filmtek
- Prism Coupler
SIMS: Secondary Ion Mass Spectrometry
- Atomika SIMS