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| {| border="2" cellspacing="0" cellpadding="2" | | {| border="2" cellspacing="0" cellpadding="2" |
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| !colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment
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| |style="background:WhiteSmoke; color:black"|<b>Electroplating-Ni</b>
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| |-
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| !style="background:silver; color:black;" align="center" width="60"|Purpose
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| |style="background:LightGrey; color:black"|
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| |style="background:WhiteSmoke; color:black"|
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| Electrochemical deposition of nickel
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| |-
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| !colspan="2" border="none" style="background:silver; color:black;" align="center"|Parameter | | !colspan="2" border="none" style="background:silver; color:black;" align="center"|Parameter |
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| |} | | |} |
| <br clear="all" /> | | <br clear="all" /> |
| {| border="2" cellspacing="0" cellpadding="2"
| |
|
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| !colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment
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| |style="background:WhiteSmoke; color:black"|<b>Electroplating-Ni</b>
| |
| |-
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| !style="background:silver; color:black;" align="center" width="60"|Purpose
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| |style="background:LightGrey; color:black"|
| |
| |style="background:WhiteSmoke; color:black"|
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| Electrochemical deposition of nickel
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| |-
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| !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Performance
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| |style="background:LightGrey; color:black"|Thickness
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| |style="background:WhiteSmoke; color:black"|
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| 0 - 1400 µm
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|
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| |-
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| |style="background:LightGrey; color:black"|Uniformity
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| |style="background:WhiteSmoke; color:black"|
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| Around 10% (depending on sample and process)
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|
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| |-
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| !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameter range
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| |style="background:LightGrey; color:black"|Temperature
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| |style="background:WhiteSmoke; color:black"|
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| 52*C
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|
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| |-
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| |style="background:LightGrey; color:black"|pH
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| |style="background:WhiteSmoke; color:black"|
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| 3,5 - 4,0 (3,5 - 3,8 recommended by manufacturer)
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|
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| |-
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| !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
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| |style="background:LightGrey; color:black"|Batch size
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| |style="background:WhiteSmoke; color:black"|
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| *<nowiki>#</nowiki> 1 x 50 mm wafer
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| *<nowiki>#</nowiki> 1 x 100 mm wafer
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| *<nowiki>#</nowiki> 1 x 150 mm wafer
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| *Maximum sample thickness: 1,0 mm
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|
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| |-
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| | style="background:LightGrey; color:black"|Allowed materials
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| |style="background:WhiteSmoke; color:black"|
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| *Most materials '''except copper and cobalt'''.
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| *Ask Danchip for details.
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| |-
| |
| |}
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