Specific Process Knowledge/Thermal Process/A1 Bor Drive-in furnace: Difference between revisions
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==A1 Furnace Boron drive-in== | |||
[[Image:A1.JPG|thumb|300x300px|A1 Boron drive in furnace:positioned in cleanroom 2]] | [[Image:A1.JPG|thumb|300x300px|A1 Boron drive in furnace:positioned in cleanroom 2]] | ||
A1 Furnace boron drive-in is a Tempress horizontal furnace for oxidation of silicon wafers, annealing and for drive-in of boron after a pre-deposition of boron in the A2 Furnace boron pre-dep. It can also be used for drive in of boron which has been ion implanted. | |||
This furnace is the uppermost furnace tube in the furnace A-stack positioned in cleanroom 2. The A-stack together with furnace C1 are the cleanest of all our furnaces. Please be aware of which substrates are allowed to enter this furnace. Check the cross contamination chart. If you are in doubt, please ask one from the furnace team. | |||
Revision as of 13:28, 26 February 2008
A1 Furnace Boron drive-in
A1 Furnace boron drive-in is a Tempress horizontal furnace for oxidation of silicon wafers, annealing and for drive-in of boron after a pre-deposition of boron in the A2 Furnace boron pre-dep. It can also be used for drive in of boron which has been ion implanted.
This furnace is the uppermost furnace tube in the furnace A-stack positioned in cleanroom 2. The A-stack together with furnace C1 are the cleanest of all our furnaces. Please be aware of which substrates are allowed to enter this furnace. Check the cross contamination chart. If you are in doubt, please ask one from the furnace team.