Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions
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*Blue film | *Blue film | ||
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In beaker or PP-bath in the fume hood in cleanroom 2: | |||
* | *All materials | ||
In RCA bench: | |||
* | *Only new wafers from the box or during RCA cleaning | ||
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*Photoresist | *Photoresist | ||