Specific Process Knowledge/Lithography/EBeamLithographyManual: Difference between revisions
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#The maximum field-size without stitching is 1000µm x 1000µm. | #The maximum field-size without stitching is 1000µm x 1000µm. | ||
#The machine has 4 cassettes that can contain | #The machine has 4 cassettes that can contain | ||
**6 wafers of 2” in size | |||
**2 wafers of 4” in size | |||
**1 wafer of 6” in size | |||
**Special cassette for chips (slot sizes 4 mm, 8 mm, 12 mm, and 20 mm) | |||
[[File:colomn.png|400px]][[File:colomn2.png|400px]] | [[File:colomn.png|400px]][[File:colomn2.png|400px]] | ||