Specific Process Knowledge/Lithography/EBeamLithographyManual: Difference between revisions
Created page with "= Purpose, location and technical specifications = The JEOL JBX-9500FS electron beam lithography system is a spot electron beam lithography system designed for use in writin..." |
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#The maximum field-size without stitching is 1000µm x 1000µm. | #The maximum field-size without stitching is 1000µm x 1000µm. | ||
#The machine has 4 cassettes that can contain | #The machine has 4 cassettes that can contain | ||
## 6 wafers of 2” in size | ## 6 wafers of 2” in size | ||
## 2 wafers of 4” in size | ## 2 wafers of 4” in size | ||
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The e-beam writer has scan speeds up to 100 MHz available. The dose, Q, shot step, p, and current, I, is chosen to meet the requirement of the pattern to be written, the writing time available, and also to meet the requirement f<100MHz. | The e-beam writer has scan speeds up to 100 MHz available. The dose, Q, shot step, p, and current, I, is chosen to meet the requirement of the pattern to be written, the writing time available, and also to meet the requirement f<100MHz. | ||
== Rough estimation of exposure time == | == Rough estimation of exposure time == | ||