Jump to content

Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions

Tigre (talk | contribs)
No edit summary
Tigre (talk | contribs)
Line 332: Line 332:
|[[File:IMG_6438.jpg|150px]]  [[File:IMG_6439.jpg|150px]]
|[[File:IMG_6438.jpg|150px]]  [[File:IMG_6439.jpg|150px]]
|- align="center"
|- align="center"
| chip Al/Cu cassette || 2" Ti cassette; wafer orientation is flat-down || 2" Al cassette; wafer orientation is flat-up || 4" Ti cassette; wafer orientation is flat-down || 4" Al cassette; wafer orientation is flat-down
| chip Al/Cu cassette with slot widths of 20 mm, 12 mm, 8 mm and 4 mm || 2" Ti cassette; wafer orientation is flat-down || 2" Al cassette; wafer orientation is flat-up || 4" Ti cassette; wafer orientation is flat-down || 4" Al cassette; wafer orientation is flat-down


|}
|}