Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions

@@ Line 160: / Line 160: @@
 = Bulk and sleeve =
 If you have structures with both bulky and fine parts that you wish to pattern either with different doses or different currents, you can use BEAMER to divide the structures in different layers or different v30-files.
-Below, an illustration of how this is done by using the Bias and Minus modules; the Bias function subtracts in this case 1 micron from the pattern, defining layer 0 (red layer). Layer 1 (green) is the original pattern minus layer 0.
+{| cellpadding="2" style="border: 2px solid darkgray;" align="right"
+! width="400" |
+! width="400" |
+|- border="0"
+|[[File:beamer8.jpg|400px|left]]
+|[[File:beamer9.jpg|400px|center]]
+|- align="center"
+| An illustration of how the 'bulk & sleeves' technique this is done by using the Bias and Minus modules; the Bias function subtracts in this case 1 micron from the pattern, defining layer 0 (red layer). Layer 1 (green) is the original pattern minus layer 0. ||In the flow to the left, the two layers are exported separately in two different v30-files. In the flow to the right, the two layers are combined in one single v30-file
+|}
-In the flow to the left, the two layers are exported separately in two different v30-files. In the flow to the right, the two layers are combined in one single v30-file:
+<br clear="all" />