Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions
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</pre> | </pre> | ||
== Dose variation defined by an array in jdf file == | |||
It is easy to repeat the pattern (v30-file) in an array with different doses in the jdf file, just type the dose modulation you wish to apply to every chip in the array: | |||
<pre> | |||
JOB/W 'TEST',4 ; 4 inch wafer | |||
PATH DTU5M | |||
ARRAY (-10000,2,10000)/(10000,1,10000) | |||
ASSIGN P(1)-> ((1,1),SHOT1) | |||
ASSIGN P(1)-> ((1,2),SHOT1) | |||
ASSIGN P(1)-> ((2,1),SHOT1) | |||
ASSIGN P(1)-> ((2,2),SHOT1) | |||
AEND | |||
PEND | |||
LAYER 1 | |||
P(1) 'tjulahej.v30' | |||
SPPRM 4.0,,,,1.0,1 | |||
STDCUR 0.22 ;nA | |||
SHOT1: MODULAT (( 0, -20)) | |||
SHOT2: MODULAT (( 0, -10)) | |||
SHOT3: MODULAT (( 0, 0)) | |||
SHOT4: MODULAT (( 0, 10)) | |||
END | |||
</pre> | |||
== Proximity Error Correction (PEC) == | |||
BEAMER has a built-in proximity error correction simulation program; import the GDS-file as usual and connect the 'PEC' module to its output. In the 'Proximity Error Correction' window you can either type Beta and Eta manually or import a point spread function (PSF). | |||
[[File:beamer4.jpg|400px|right]] | |||
After converting to v30-format, the dose variation is illustrated in your pattern: | |||
BEAMER has at this point created a jdi-file in the same folder as the v30-file. This jdi-file is the shot modulation that should be inserted in the jdf-file (see section 4 in the sdf- and jdf-file preparation manual). The jdi-file opens with SuperEdi. | |||
= Bulk and sleeve = | = Bulk and sleeve = | ||