Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions
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The multipass method smooths the pattern writing over many fields, each field writing the pattern with e.g. half the dose in different areas of the main deflector; this is however not recommended for field sizes larger than 500 mm x 500 mm, as the distorion of the main deflector using larger field sizes may be larger than the stitching errors of two fields. | The multipass method smooths the pattern writing over many fields, each field writing the pattern with e.g. half the dose in different areas of the main deflector; this is however not recommended for field sizes larger than 500 mm x 500 mm, as the distorion of the main deflector using larger field sizes may be larger than the stitching errors of two fields. | ||
=Dose variations= | =Dose variations= | ||