Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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To request for an e-beam training session, contact [mailto:e-beam@danchip.dtu.dk e-beam@danchip.dtu.dk]; a DTU Danchip personnel will hereafter provide a time slot. Users require '''at least 4 training sessions''' before being allowed full acccess to the machine. The first training will focus on file preparation and compilation alone. | To request for an e-beam training session, contact [mailto:e-beam@danchip.dtu.dk e-beam@danchip.dtu.dk]; a DTU Danchip personnel will hereafter provide a time slot. Users require '''at least 4 training sessions''' before being allowed full acccess to the machine. The first training will focus on file preparation and compilation alone. | ||
Before you request for a training on the machine | Before you request for a training on the machine, fulfill the following steps: | ||
'''Prepare a v30-file:''' | |||
# Prepare your pattern using a layout software (L-edit, CleWin, CAD) and export that to GDS format. Check your GDS-file by importing it in e.g. <span class="plainlinks">[http://www.wieweb.com/ns6/index.html CleWin]</span> or L-edit. In order to reach the files from the computers inside the cleanroom it is recommended to either dropbox them or send them per email to yourself. | |||
# Convert the GDS file to v30 using BEAMER; a manual for BEAMER software is found [[Specific_Process_Knowledge/Lithography/EBeamLithography/BEAMER|here]] | |||
'''Create sdf and jdf-files:''' | |||
#*download [http://download.cnet.com/SuperEdi/3000-2352_4-10291091.html SuperEdi], | #*download [http://download.cnet.com/SuperEdi/3000-2352_4-10291091.html SuperEdi], | ||
#*read the sdf and jdf-file manual found [[Specific_Process_Knowledge/Lithography/EBeamLithography/FilePreparation|here]], | #*read the sdf and jdf-file manual found [[Specific_Process_Knowledge/Lithography/EBeamLithography/FilePreparation|here]], | ||