Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions

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 <pre>
-  Module 	Function
+  Module      Function
-  Import 	Imports a GDS, CIF or v30-file
+  Import      Imports a GDS, CIF or v30-file
-  Export 	Exports to CIF or v30-format
+  Export      Exports to GDS, CIF or v30-format
-  Grid 	Modifies the base unit of the imported file
+  Grid 	     Modifies the base unit of the imported file
-  Fracture 	Optimizes the fracturing of the layout
+  Fracture    Optimizes the fracturing of the layout
-  Heal 	Removes overlaps in the layout and joins abutting polygons
+  Heal 	     Removes overlaps in the layout and joins abutting polygons
-  Bias 	Adds or subtracts geometrical bias to the pattern
+  Bias 	     Adds or subtracts geometrical bias to the pattern
-  Merge 	Merges two layouts
+  Merge 	     Merges two layouts
-  Minus 	Subtracts two layouts
+  Minus 	     Subtracts two layouts
-  PEC 	Proximity Error Correction
+  PEC 	     Proximity Error Correction
-  Split 	Splits the output in two
+  Split 	     Splits the output in two
 </pre>
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 [[File:beamer10.jpg|400px]]
 By clicking on active modules, the layout of the file becomes visible in the layout view area.
 = Simple conversion from GDSII to v30 =