Specific Process Knowledge/Lithography/EBeamLithography/FilePreparation: Difference between revisions

Revision as of 11:34, 18 June 2015 view source Tigre (talk \| contribs) DCH-Employees-701 2,257 edits →Checking the layout of the final mgn-file ← Older edit		Revision as of 11:34, 18 June 2015 view source Tigre (talk \| contribs) DCH-Employees-701 2,257 edits →Examples Newer edit →
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	When the pattern is accepted by user, the e-beam exposure can start.		When the pattern is accepted by user, the e-beam exposure can start.

	== Examples ==		= Examples of sdf and jdf files=