Specific Process Knowledge/Lithography/EBeamLithography/FilePreparation: Difference between revisions

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 note 2: Always add 10% to the current in this command to make sure you work well below 100 MHz and thus will not be affected if the current fluctuates above the base current.
+== Dose variation ==
+The dose modulation is defined in a percentage addition to the base dose, i.e. the final dose, Q, is given by the base dose, RESIST, and modulation, m, by this formula:
+Q = (RESIST · (100 + m))/100
+In the jdf-file, you assign different layers of the pattern to different dose modulations, m.
+ If you define the dose variations by different datatype or layertype as described in section 3.2 of the BEAMER manual, you should define the dose for each layer number. You can check the layer numbers in BEAMER when you view the pattern, as seen in section 3.1 and 3.2 in the BEAMER manual.
+<pre>
+JOB/W    'TINE1',4   ;4inch wafer
+PATH   DRF5M
+ ARRAY       (-500,1,1000)/(500,1,1000)
+  ASSIGN P(1)->((*,*),SHOT1)
+ AEND
+PEND
+LAYER  1
+P(1)  'tinegjul122013a.v30'
+SPPRM 4.0,,,,1.0,1
+STDCUR  2.2 ;nA
+SHOT1: MODULAT (( 0, -10) , ( 1, 0) , ( 2, 10))
+END
+</pre>
+The above example subtracts 10% from the base dose in layer 0 and adds 10% to the base dose in layer 2.
+Alternatively, you can make simple dose variations by repeating a simple structure in an array in the jdf-file, and dedicate different part of the array to different doses:
+<pre>
+JOB/W    'TINE1',4    ;4inch wafer
+PATH   DRF5M
+  ARRAY       (-1500,3,1000)/(1500,1,1000)
+    ASSIGN P(1)->((1,1),SHOT1)
+    ASSIGN P(1)->((2,1),SHOT2)
+    ASSIGN P(1)->((3,1),SHOT3)
+  AEND
+PEND
+LAYER  1
+P(1)  'tinegjul122013b.v30'
+SPPRM 4.0,,,,1.0,1
+STDCUR  2.2 ;nA
+SHOT1: MODULAT (( 0,-10))
+SHOT2: MODULAT (( 0,0 ))
+SHOT3: MODULAT (( 0,10))
+END
+</pre>