Specific Process Knowledge/Lithography/EBeamLithography/FilePreparation: Difference between revisions
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JOB/W 'SIMPLE',4 4" wafer, jobname is 'SIMPLE', max. 20 capital letters | JOB/W 'SIMPLE',4 4" wafer, jobname is 'SIMPLE', max. 20 capital letters | ||
PATH DRF5M | PATH DRF5M The DRF5M calibration is used (see section 3.3) | ||
ARRAY (0,3,2000)/(0,3,3000) | ARRAY (0,3,2000)/(0,3,3000) see note 1 | ||
ASSIGN P(1) -> (*,1) Pattern 1 is assigned to row 1-3 coloumn 1 | |||
ASSIGN P(1) -> (*,1) | ASSIGN P(2) -> (*,2-3) Pattern 2 is assigned to row 1-3 coloumn 2-3 | ||
SKIP (1,1) Nothing is assigned to chip (1,1) | |||
ASSIGN P(2) -> (*,2-3) | AEND End-command to 'ARRAY' | ||
SKIP (1,1) | PEND End-command to 'PATH' | ||
AEND | |||
PEND | |||
LAYER 1 | LAYER 1 Start of layer block 1 | ||
P(1) 'template1.v30' | P(1) 'template1.v30' Pattern 1 defined in 'template1.v30' | ||
P(2) 'template2.v30' | P(2) 'template2.v30' Pattern 2 defined in 'template2.v30' | ||
SPPRM 4.0,,,,1.0,1 | SPPRM 4.0,,,,1.0,1 Beam parameters (default - see section 6.2) | ||
STDCUR 0.22 ;nA | STDCUR 0.22 ;nA Beam current (in nA) used for writing, see note 2 | ||
END | END End of jdf-file | ||
___________________________________________________________________________ | ___________________________________________________________________________ | ||