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| |} | | |} |
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| Example 2.1: Two 2” wafers are loaded in position 2A and 2B with separate JDF-files
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| ('thomasjfeb242010’ and ‘jonaspfeb242010’ respectively). The 2" cassette is located in slot
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| no. 3 in the autoloader. After exposure, the cassette will be unloaded to slot no. 3 again.
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| ___________________________________________________________________________
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| MAGAZIN 'PLAIN'
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| ;---------------------------
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| ; WAFER #2A FOR THOMAS
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| ;---------------------------
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| #3
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| %2A
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| JDF 'thomasjfeb242010',1
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| ACC 100
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| CALPRM '0.2na_ap5'
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| DEFMODE 2 ;2_stage deflection
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| RESIST 320
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| SHOT A,12
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| OFFSET(0,0)
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| ;---------------------------
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| ; WAFER #2B FOR JONAS
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| ;---------------------------
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| #3
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| %2B
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| JDF 'jonaspfeb242010',1
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| ACC 100
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| CALPRM '0.2na_ap5'
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| DEFMODE 2 ;2_stage deflection
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| RESIST 250
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| SHOT A,8
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| OFFSET(0,0)
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| ;---------------------------
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| END
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| ______________________________________________________________________________
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| Example 2.2: An array of 20 chips is written on one 4" wafer. The first 10 coloums of the array is defined in layer block no. 1 of the jdf, coloumn 11-20 is defined in layer block no. 2 of the jdf. The two layer blocks uses different beam shot pitch and base dose. The two layer blocks must be called in two different sequences in the sdf-file.
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| ______________________________________________________________________________
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| MAGAZIN 'LAYERS'
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|
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| ;---------------------------------------
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| ; THIS IS FOR WAFER #1 %4A
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| ;---------------------------------------
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| #1
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| %4A
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| JDF 'layers',1
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| ACC 100
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| CALPRM '0.2na_ap5'
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| DEFMODE 2 ;2_stage deflection
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| OFFSET(0,0)
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| ;---------------------------------------
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|
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| #1
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| %4A
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| JDF 'layers',2
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| ACC 100
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| CALPRM '0.2na_ap5'
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| DEFMODE 2 ;2_stage deflection
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| OFFSET(0,0)
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| ;---------------------------------------
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|
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| END 1
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|
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| _______________________________________________________________________________
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|
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| JOB/W 'TWOLAYERS',4
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| PATH DRF5M
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| ARRAY (-10000,20,2000)/( 10000,20,2000)
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|
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| ASSIGN P(1) -> (1-10,*)
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| ASSIGN P(2) -> (11-20,*)
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| AEND
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| PEND
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| LAYER 1
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| P( 1 ) 'test2.v30'
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| SPPRM 4.0,,,,1.0,1
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| SHOT A,20
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| RESIST 220
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| STDCUR 0.22 ;nA
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| LAYER 2
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| P( 2 ) 'test2.v30'
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| SPPRM 4.0,,,,1.0,1
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| SHOT A,40
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| RESIST 250
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| STDCUR 0.22 ;nA
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|
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| END
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