Specific Process Knowledge/Lithography/EBeamLithography/FilePreparation: Difference between revisions

← Older edit Newer edit →

VisualWikitext

@@ Line 123: / Line 123: @@
 ! 2 wafers with separate jdf files
 |-
-!colspan="2"| Two 2” wafers are loaded in position 2A and 2B with separate JDF-files ('thomasjfeb242010’ and ‘jonaspfeb242010’ respectively). The 2" cassette is located in slot
+!colspan="2"| An array of 20 chips is written on one 4" wafer. The first 10 coloums of the array is defined in layer block no. 1 of the jdf, coloumn 11-20 is defined in layer block no. 2 of the jdf. The two layer blocks uses different beam shot pitch and base dose. The two layer blocks must be called in two different sequences in the sdf-file.
-no. 3 in the autoloader. After exposure, the cassette will be unloaded and stage left empty.
 |-
 |-
 |
-MAGAZIN 'PLAIN'
+MAGAZIN 'LAYERS'
-;---------------------------
-; WAFER #2A FOR THOMAS
-;---------------------------
-#3
-%2A
-JDF     'thomasjfeb242010',1
+;---------------------------------------
+; THIS IS FOR WAFER #1  %4A
+;---------------------------------------
+#1
+%4A
+JDF     'layers',1
 ACC 100
 CALPRM '0.2na_ap5'
 DEFMODE 2      ;2_stage deflection
-RESIST 320
-SHOT A,12
 OFFSET(0,0)
+;---------------------------------------
-;---------------------------
+#1
+%4A
-; WAFER #2B FOR JONAS
+JDF     'layers',2
-;---------------------------
-#3
-%2B
-JDF     'jonaspfeb242010',1
 ACC 100
 CALPRM '0.2na_ap5'
 DEFMODE 2      ;2_stage deflection
+OFFSET(0,0)
+;---------------------------------------
+END 1
+|-
-RESIST 250
+|-
+|JOB/W  'TWOLAYERS',4
-SHOT A,8
+PATH DRF5M
+ ARRAY   (-10000,20,2000)/( 10000,20,2000)
-OFFSET(0,0)
+  ASSIGN  P(1) -> (1-10,*)
+  ASSIGN  P(2) -> (11-20,*)
+ AEND
+PEND
+LAYER   1
+P( 1 )  'test2.v30'
+SPPRM 4.0,,,,1.0,1
+SHOT A,20
+RESIST 220
+STDCUR  0.22 ;nA
-;---------------------------
+LAYER   2
+P( 2 )  'test2.v30'
+SPPRM 4.0,,,,1.0,1
+SHOT A,40
+RESIST 250
+STDCUR  0.22 ;nA
 END
-|-
-|-
-|
 |-