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Specific Process Knowledge/Wafer cleaning/7-up & Piranha: Difference between revisions

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|'''Batch size'''
|'''Batch size'''
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1-19/25  4" wafers or 5 masks at a time  
1-19/25  4" wafers or 4 masks at a time  
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1-5 4" wafer at a time
1-5 4" wafer at a time
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[[Image:7-up_RR4.JPG|300x300px|right|thumb|7-up in cleanroom 4]]
[[Image:7-up_6inch.jpg|300x300px|right|thumb|7-up 6" in cleanroom 4. <br\> -Up to 25 wafers of 4" at a time.<br\> -Materials allowed: Silicon, Silicon oxide, Silicon nitride, PolySi]]
[[Image:7-up_Mask.jpg|300x300px|right|thumb|7-up for masks and glass wafers positioned in cleanroom 4:<br\> -Up to 25 wafers of 4" at a time or 4 masks.<br\> -Materials allowed: Silicon, Silicon oxide, Silicon nitride, PolySi, glass, chromium]]
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