Specific Process Knowledge/Lithography/EBeamLithography/FilePreparation: Difference between revisions
Created page with "= Introduction = An e-beam exposure requires a v30-file, which contains information on the pattern to write, a jobdeck file (jdf-file), and a schedule file (sdf-file). The sd..." |
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= Introduction = | = Introduction = | ||
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An e-beam exposure requires a v30-file, which contains information on the pattern to write, a jobdeck file (jdf-file), and a schedule file (sdf-file). The sdf- and jdf-file contain information about size and position of substrate, dose, current, and shot step. The sdf-file, jdf-file and v30-file are compiled to a magazine-file (mgn) on the 9500 computer. | An e-beam exposure requires a v30-file, which contains information on the pattern to write, a jobdeck file (jdf-file), and a schedule file (sdf-file). The sdf- and jdf-file contain information about size and position of substrate, dose, current, and shot step. The sdf-file, jdf-file and v30-file are compiled to a magazine-file (mgn) on the 9500 computer. | ||
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When a magazine-file is prepared, the actual shot time can be estimated by the e-beam computer (9500). | When a magazine-file is prepared, the actual shot time can be estimated by the e-beam computer (9500). | ||
= Preparing a GDS file = | = Preparing a GDS file = | ||