Specific Process Knowledge/Etch/Wet Silicon Nitride Etch: Difference between revisions
| Line 55: | Line 55: | ||
|'''Selectivity R<sub>Si<sub>3</sub>N<sub>4</sub></sub> / R<sub>SiO<sub>2</sub></sub>''' | |'''Selectivity R<sub>Si<sub>3</sub>N<sub>4</sub></sub> / R<sub>SiO<sub>2</sub></sub>''' | ||
|~20 | |~20 | ||
|> | |The selectivity (sirich nitride:oxide) is higher at 160 <sup>o</sup>C than at 180 <sup>o</sup>C | ||
|- | |- | ||
|'''Batch size''' | |'''Batch size''' | ||