Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions
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*Blue film | *Blue film | ||
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*Photoresist (in beaker) | *Photoresist (in beaker or PP-bath in fume hood RR2) | ||
*Silicon nitride (in beaker) | *Silicon nitride (in beaker) | ||
*PolySi (in beaker) | *PolySi (in beaker) | ||