Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma UV processing: Difference between revisions
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It produces a contact angle of 81-82° on an oxidized silicon surface. General information on HMDS priming can be found [[Specific_Process_Knowledge/Lithography/Coaters/Spin_Coater:_Gamma_UV_processing#HMDS priming|here]]. | It produces a contact angle of 81-82° on an oxidized silicon surface. General information on HMDS priming can be found [[Specific_Process_Knowledge/Lithography/Coaters/Spin_Coater:_Gamma_UV_processing#HMDS priming|here]]. | ||
'' | ''Sequence names, process parameters, and test results:'' | ||
*'''(0001) HMDS Standard''' | *'''(0001) HMDS Standard''' | ||
VPO temperature: 120°C <br> | VPO temperature: 120°C <br> | ||