Specific Process Knowledge/Wafer cleaning/RCA: Difference between revisions

Revision as of 09:43, 21 February 2008 view source Louise (talk \| contribs) danchip 4 edits New page: The RCA clean is used for cleaning the wafers before taking them into the furnaces. It consist of two solutions: RCA1 and RCA2 The RCA1 contains H2O, NH4OH and H2O2 (5:1:1). It is used fo...		Revision as of 11:03, 21 February 2008 view source BGE (talk \| contribs) Bureaucrats, danchip, Administrators 2,908 edits No edit summary Newer edit →
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	The RCA clean is used for cleaning the wafers before taking them into the furnaces.		The RCA clean is used for cleaning the wafers before taking them into the furnaces and a few other equipments (check the cross contamination sheet).
	It consist of two solutions: RCA1 and RCA2		It consist of two solutions: RCA1 and RCA2