Specific Process Knowledge/Etch/ICP Metal Etcher/Barc Etch: Difference between revisions

From LabAdviser
Bghe (talk | contribs)
Bghe (talk | contribs)
Line 8: Line 8:
! Parameter
! Parameter
! Barc etch with CF4
! Barc etch with CF4
! Barc etch with O2
|-  
|-  
|Coil power||800W
|Coil power||800W||150w
|-
|-
|Platen power||100W
|Platen power||100W||15W
|-  
|-  
|Pressure||3 mTorr
|Pressure||3 mTorr||5mTorr
|-
|-
|Flow rate CF4||4 sccm
|Flow rate CF4||4 sccm||
|-
|-
|Flow rate H2||20sccm
|Flow rate H2||20sccm||
 
|-
|Flow rate O2||||20sccm
|-
|-
|}
|}
Line 24: Line 26:
{| border="1" cellspacing="1" cellpadding="2"  align="left"
{| border="1" cellspacing="1" cellpadding="2"  align="left"
! Parameter
! Parameter
! Results
! Results with 'Barc etch with CF'
! Results with 'Barc etch with O2'
|-  
|-  
|Etch rate in barc||'''52 nm in 30s''' ''[bghe 20150519]''
|Etch rate in barc||'''52 nm in 30s''' ''[bghe 20150519]''||'''62 nm in 50s''' ''[bghe 20150521]''
 
|-
|-
|Etch rate in KRF resist||'''27 nm in 30s''' ''[bghe 20150519]''
|Etch rate in KRF resist||'''27 nm in 30s''' ''[bghe 20150519]''||'''73 nm in 50s''' ''[bghe 20150521]''
|-  
|-  
|Selectivity KRF:Barc||'''1:2'''  
|Selectivity KRF:Barc||'''1:2''' ||'''1:0.8'''
|-
|-
|Etch 65nm barc||'''Use 40-45s'''
|Etch 65nm barc||'''Use 40-45s'''||'''Use 55-60s'''
|-
|-
|}
|}
<br/>
<br/>

Revision as of 12:11, 22 May 2015

Feedback to this page: click here

Barc Etch

Etching barc with a dedicated recipe for barc etching is a good idea if you are on the limit of having enough DUV resist mask to reach etch depth you need.Here is an example of a barc etch I have started testing.

Parameter Barc etch with CF4 Barc etch with O2
Coil power 800W 150w
Platen power 100W 15W
Pressure 3 mTorr 5mTorr
Flow rate CF4 4 sccm
Flow rate H2 20sccm
Flow rate O2 20sccm


Parameter Results with 'Barc etch with CF' Results with 'Barc etch with O2'
Etch rate in barc 52 nm in 30s [bghe 20150519] 62 nm in 50s [bghe 20150521]
Etch rate in KRF resist 27 nm in 30s [bghe 20150519] 73 nm in 50s [bghe 20150521]
Selectivity KRF:Barc 1:2 1:0.8
Etch 65nm barc Use 40-45s Use 55-60s