Specific Process Knowledge/Etch/ICP Metal Etcher/Barc Etch: Difference between revisions
No edit summary |
|||
Line 7: | Line 7: | ||
{| border="1" cellspacing="1" cellpadding="2" align="left" | {| border="1" cellspacing="1" cellpadding="2" align="left" | ||
! Parameter | ! Parameter | ||
! | ! Barc etch with CF4 | ||
|- | |- | ||
|Coil power||800W | |Coil power||800W |
Revision as of 12:23, 19 May 2015
Feedback to this page: click here
Barc Etch
Etching barc with a dedicated recipe for barc etching is a good idea if you are on the limit of having enough DUV resist mask to reach etch depth you need.Here is an example of a barc etch I have started testing.
Parameter | Barc etch with CF4 |
---|---|
Coil power | 800W |
Platen power | 100W |
Pressure | 3 mTorr |
Flow rate CF4 | 4 sccm |
Flow rate H2 | 20sccm |
Parameter | Results |
---|---|
Etch rate in barc | 52nm in 30s |
Etch rate in KRF resist | 27 nm in 30s |
Selectivity KRF:Barc | 1:2 |
Etch 65nm barc | Use 40-45s |