Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBE blazed gratings: Difference between revisions

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=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]=
=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]=


<gallery widths="300px" heights="250px">
<gallery caption="Blazed gratingen in fused silica etched with Cr and DUV resist as masking layer" widths="300px" heights="250px">


Image:IBE 30min -Cr1.jpg |30min etch with 100nm Cr mask, used recipe BGHE blazed gratings with CHF3
Image:IBE 30min -Cr1.jpg |30min etch with 100nm Cr mask, used recipe BGHE blazed gratings with CHF3

Revision as of 06:38, 13 May 2015

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  • Blazed gratingen in fused silica etched with Cr and DUV resist as masking layer
  • 30min etch with 100nm Cr mask, used recipe BGHE blazed gratings with CHF3
    30min etch with 100nm Cr mask, used recipe BGHE blazed gratings with CHF3
  • 45min etch with 100nm Cr mask, used recipe BGHE blazed gratings with CHF3
    45min etch with 100nm Cr mask, used recipe BGHE blazed gratings with CHF3
  • 20min etch with Krf resist, all resist is gone, used recipe BGHE blazed gratings
    20min etch with Krf resist, all resist is gone, used recipe BGHE blazed gratings
  • 15+30min etch with 50nm Cr mask, used recipe BGHE blazed gratings with CHF3
    15+30min etch with 50nm Cr mask, used recipe BGHE blazed gratings with CHF3
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