Specific Process Knowledge/Wafer cleaning/7-up & Piranha: Difference between revisions
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Cleaning of wafers or masks using the dedicated tanks. There are one tank for masks and one for 4-6" wafers in cleanroom 4 and one tank in cleanroom 3 for 4" wafers only. | Cleaning of wafers or masks using the dedicated tanks. There are one tank for masks and pyrexwafers and one for 4-6" Si wafers in cleanroom 4 and one tank in cleanroom 3 for 4" wafers only. | ||
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Cleaning of wafers using a beaker in the fumehood in cleanroom 2.Used for glass wafers or wafers with metal or other materials that you are not allowed to put in the 7-up for wafers. | Cleaning of wafers using a beaker in the fumehood in cleanroom 2.Used for glass wafers or wafers with metal or other materials that you are not allowed to put in the 7-up for wafers. | ||
Revision as of 13:42, 20 February 2008
Cleaning of wafers or masks
Cleaning of wafers or masks with sulphuric acid can be done either in a dedicated tank "7-up" or in the fumehood in a beaker "Piranha":
| 7-up | Piranha | |
|---|---|---|
| General description |
Cleaning of wafers or masks using the dedicated tanks. There are one tank for masks and pyrexwafers and one for 4-6" Si wafers in cleanroom 4 and one tank in cleanroom 3 for 4" wafers only. |
Cleaning of wafers using a beaker in the fumehood in cleanroom 2.Used for glass wafers or wafers with metal or other materials that you are not allowed to put in the 7-up for wafers. |
| Chemical solution | 98% Sulfuricacid and Ammoniumsulfat | 98% Sulfuricacid and Hydrogenperoxide 4:1 |
| Process temperature | 80 oC | ~70 oC the chemicals will heat up to working temperature during mixing, therefore be carefull! |
| Possible masking materials |
None |
None |
| Etch rate |
Cleaning only |
Cleaning only |
| Batch size |
19-25 4" wafers or 5 masks at a time |
1-5 4" wafer at a time |
| Size of substrate |
4-6" wafers |
2-4" wafers |