Specific Process Knowledge/Wafer cleaning/7-up & Piranha: Difference between revisions
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|'''General description''' | |'''General description''' | ||
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Cleaning of wafers or masks using the dedicated tanks. | Cleaning of wafers or masks using the dedicated tanks. There are one tank for masks and one for 4-6" wafers in cleanroom 4 and one tank in cleanroom 3 for 4" wafers only. | ||
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Cleaning of wafers | Cleaning of wafers using a beaker in the fumehood in cleanroom 2.Used for glass wafers or wafers with metal or other materials that you are not allowed to put in the 7-up for wafers. | ||
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|'''Chemical solution''' | |'''Chemical solution''' | ||
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|80 <sup>o</sup>C | |80 <sup>o</sup>C | ||
|~70 <sup>o</sup>C | |~70 <sup>o</sup>C the chemicals will heat up to working temperature during mixing, '''therefore be carefull!''' | ||
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|'''Batch size''' | |'''Batch size''' | ||
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25 4" wafers or 5 masks at a time | 19-25 4" wafers or 5 masks at a time | ||
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1-5 4" wafer at a time | 1-5 4" wafer at a time | ||