Specific Process Knowledge/Thin Film deposition/ALD/TiO2 deposition using ALD: Difference between revisions
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In the graphs below the TiO<sub>2</sub> thickness as function of the number of cycles for deposition temperatures between 150 <sup>o</sup>C and 350 <sup>o</sup>C can be seen. From the equations the number of cycles required for a certain thickess can be calculated. | In the graphs below the TiO<sub>2</sub> thickness as function of the number of cycles for deposition temperatures between 150 <sup>o</sup>C and 350 <sup>o</sup>C can be seen. From the equations the number of cycles required for a certain thickess can be calculated. | ||
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image:ALD_TiO2_grow_rate_250C.jpg| Temperature 250 <sup>o</sup>C. | image:ALD_TiO2_grow_rate_250C.jpg| Temperature 250 <sup>o</sup>C. | ||
image:ALD_TiO2_grow_rate_350C.jpg| Temperature 350 <sup>o</sup>C. | image:ALD_TiO2_grow_rate_350C.jpg| Temperature 350 <sup>o</sup>C. | ||
</gallery> | |||
Some some SEM images of TiO<sub>2</sub> deposited on a silicon surface at different temperatures between 150 <sup>o</sup>C and 120 <sup>o</sup>C are shown below: | |||
<gallery caption="Titanium dioxide thickness as function of number of cycles" widths="200px" heights="200px" perrow="5"> | |||
image:TiO2 150C 1200 cycles Si_HF_treated.jpg| Temperature 150 <sup>o</sup>C. | |||
image:TiO2 150C 1200 cycles Si_untreated.jpg| Temperature 250 <sup>o</sup>C. | |||
image:TiO2 250C 750cycles_Si_untreated.jpg| Temperature 350 <sup>o</sup>C. | |||
image:TiO2 1000 cycles 300C Si_HF.jpg| Temperature 350 <sup>o</sup>C. | |||
image:TiO2 1000 cycles 300C Si_un.jpg| Temperature 350 <sup>o</sup>C. | |||
image:TiO2 350C 1250 cycles Si_HF_treated.jpg| Temperature 350 <sup>o</sup>C. | |||
</gallery> | </gallery> | ||