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Specific Process Knowledge/Thin Film deposition/ALD/TiO2 deposition using ALD: Difference between revisions

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image:ALD_TiO2_grow_rate_350C.jpg| Temperature 250 <sup>o</sup>C.
image:ALD_TiO2_grow_rate_350C.jpg| Temperature 250 <sup>o</sup>C.
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Evgeniy Shkondin, DTU Danchip, 2014.
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