Specific Process Knowledge/Wafer cleaning/7-up & Piranha: Difference between revisions

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 ==Cleaning of wafers or masks==
-Cleaning of wafers or masks with sulphuric acid can be done either in a dedicated tank "7-up" or in the fumehood in a beaker "Piranda":
+Cleaning of wafers or masks with sulphuric acid can be done either in a dedicated tank "7-up" or in the fumehood in a beaker "Piranha":
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 |'''General description'''
 |
-Etch of pure Gold with or without photoresist mask.
+Cleaning of wafers or masks using the dedicated tank.
 |
-Etch of pure Gold (as stripper).
+Cleaning of wafers or masks using a beaker in the fumehood.
 |-
 |'''Chemical solution'''
-|KJ:J<math>_2</math>:H<math>_2</math>O   (100g:25g:500ml)
+|98% Sulfuricacid and Hydrogenperoxide 4:1
 |HCl:HNO<math>_3</math>  (3:1)
 |-
 |'''Process temperature'''
-|20 <sup>o</sup>C
+|80 <sup>o</sup>C
-|20 <sup>o</sup>C
+|~70 <sup>o</sup>C
 |-