Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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== Field stitching == | == Field stitching == | ||
In this experiment, several writing fields were stitched together. Vernier marks on the edges of | In this experiment, several writing fields (1 mm x 1 mm) were stitched together. Vernier marks on the edges of each writing field shows the field stitching bewteen fields. | ||
After exposure and development, 5/45 nm Ti/Au has been depsoited in Wordentec, and lift-off performed in a beaker with AR 600-71. In order to make the lift-off succeed, it was necessary to immerse the beaker 4s in an ultrasonic bath. | |||
[[File:FieldToField.png|700px]] | [[File:FieldToField.png|700px]] | ||