Specific Process Knowledge/Wafer and sample drying: Difference between revisions
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Single wafer spin dryers is useful for drying wafers if you only have one or few wafers to dry. The rotation speed is typically 45*60rpm for 30-45 sec. | Single wafer spin dryers is useful for drying wafers if you only have one or few wafers to dry. The rotation speed is typically 45*60rpm for 30-45 sec. | ||
<gallery caption="Different places to dry your wafers" widths="300px" heights="225px" perrow=" | <gallery caption="Different places to dry your wafers" widths="300px" heights="225px" perrow="3"> | ||
image:Swsd1.jpg|Single wafer spin dryer 1 in B-1. | image:Swsd1.jpg|Single wafer spin dryer 1 in B-1. | ||
image:Swsd2.jpg|Single wafer spin dryer 2 in C-1. | image:Swsd2.jpg|Single wafer spin dryer 2 in C-1. | ||